| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat treatment apparatus and a heat treatment method, which uniformly heat-treat a semiconductor layer including impurity, and to provide a method of manufacturing a semiconductor apparatus, which uses heat treatment equipment. SOLUTION: The heat treatment apparatus and method include a molten metal, a means irradiating the molten metal with light and a means holding a workpiece so that at least a part of the workpiece is brought into contact with the molten metal. The molten metal is heated by irradiating the molten metal with light by the means irradiating light. Then, the workpiece is heat-treated with the heated molten metal as a heating medium. COPYRIGHT: (C)2009,JPO&INPIT
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