INDIUM OXIDE TRANSPARENT CONDUCTIVE FILM AND METHOD FOR PRODUCING THE SAME

摘要

Disclosed is a transparent conductive film which is formed as an amorphous film by using a sputtering target containing an oxide sintered body which contains indium oxide, and if necessary tin, while containing not less than 0.00001 mole but less than 0.10 mole of barium per 1 mole of indium. This transparent conductive film is characterized by containing barium while also containing indium oxide, and if necessary tin. This transparent conductive film is also characterized by being formed under such a condition that the partial pressure of water is not less than 1.0 x 10-4 Pa but not more than 1.0 x 10-1 Pa.