| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition obtaining an adequate residual film ratio even under ≤1,000 J/m<SP>2</SP>of exposure energy, and capable of forming a spacer or a protective film for a display device excellent in adhesion and rubbing resistance and further having a high elastic recovery rate even at a post-bake temperature of <200°C. <P>SOLUTION: The radiation-sensitive resin composition comprises [A] a copolymer of (a1) at least one selected from the group consisting of unsaturated carboxylic acids and unsaturated carboxylic acid anhydrides and (a2) an unsaturated compound other than the component (a1), [B] a polymerizable compound having an ethylenically unsaturated bond, [C] a radiation-sensitive radical generator, and [D] a specific onium-fluorinated alkylfluorophosphate. <P>COPYRIGHT: (C)2009,JPO&INPIT |
