发明名称 Illuminating system for use in projection exposure system, has curved field generation module with optically active surfaces which are designed such that curved light-bundle is formed by stream deflection of incident light-bundle
摘要 <p>The system (7) has a curved field generation module (15) with two optically active surfaces, which run steadily over an aperture along main extension direction, where the aperture is formed by the incident illumination light-bundle. The surfaces are designed such that a curved illumination light-bundle is formed by stream deflection of the incident illumination light-bundle. The field generation module comprises two optical components comprising optically operative surfaces, which run parallel to a bundle center stream (10). An independent claim is also included for a method for manufacturing a micro structured component with a projection exposure system.</p>
申请公布号 DE102008041991(A1) 申请公布日期 2009.04.09
申请号 DE20081041991 申请日期 2008.09.11
申请人 CARL ZEISS SMT AG 发明人 EPPLE, ALEXANDER;FELDMANN, HEIKO
分类号 G03F7/20;F21V5/00;G02B27/09 主分类号 G03F7/20
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