发明名称 |
Illuminating system for use in projection exposure system, has curved field generation module with optically active surfaces which are designed such that curved light-bundle is formed by stream deflection of incident light-bundle |
摘要 |
<p>The system (7) has a curved field generation module (15) with two optically active surfaces, which run steadily over an aperture along main extension direction, where the aperture is formed by the incident illumination light-bundle. The surfaces are designed such that a curved illumination light-bundle is formed by stream deflection of the incident illumination light-bundle. The field generation module comprises two optical components comprising optically operative surfaces, which run parallel to a bundle center stream (10). An independent claim is also included for a method for manufacturing a micro structured component with a projection exposure system.</p> |
申请公布号 |
DE102008041991(A1) |
申请公布日期 |
2009.04.09 |
申请号 |
DE20081041991 |
申请日期 |
2008.09.11 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
EPPLE, ALEXANDER;FELDMANN, HEIKO |
分类号 |
G03F7/20;F21V5/00;G02B27/09 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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