| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition having good exposure latitude and pattern formation in not only normal exposure (dry exposure) but also liquid immersion exposure and having good exposure latitude and pattern formation in double exposure, and to provide a pattern forming method using the positive photosensitive composition. <P>SOLUTION: The positive photosensitive composition contains (A) a compound generating acid by irradiation of active light or radiation, (B) a resin which includes a group decomposed by action of acid and increasing solubility in alkali developing solution and which includes a repeating unit (Bb) having non-polycyclic hydrocarbon in a leaving group by action of acid of the group increasing solubility in alkali developing solution, and (C) a compound decomposed by action of acid and generating acid. The pattern forming method uses the positive photosensitive composition. <P>COPYRIGHT: (C)2009,JPO&INPIT |
