发明名称 |
RADIATION-SENSITIVE COMPOSITION |
摘要 |
<p>Disclosed is a radiation-sensitive composition containing a first polymer (A) which contains no fluorine atom and becomes alkali-soluble by the action of an acid, a second polymer (B) having a repeating unit (b1) represented by the general formula (1) below and a repeating unit (b2) containing a fluorine atom, and a radiation-sensitive acid generator (C). This radiation-sensitive composition contains 0.1-20 parts by mass of the second polymer (B) per 100 parts by mass of the first polymer (A), and enables to form a resist film which can effectively suppress generation of water mark defects or bubble defects which are caused by liquid immersion exposure. (In the general formula (1), R1 represents a methyl group or the like, and R2 represents a linear or branched alkyl group having 1-12 carbon atoms or the like.)</p> |
申请公布号 |
WO2009044668(A1) |
申请公布日期 |
2009.04.09 |
申请号 |
WO2008JP67391 |
申请日期 |
2008.09.26 |
申请人 |
JSR CORPORATION;NISHIMURA, YUKIO;MIYATA, HIROMU |
发明人 |
NISHIMURA, YUKIO;MIYATA, HIROMU |
分类号 |
G03F7/039;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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