INDIUM OXIDE TRANSPARENT CONDUCTIVE FILM AND METHOD FOR PRODUCING THE SAME

摘要

Disclosed is a transparent conductive film which is formed as an amorphous film by using a sputtering target containing an oxide sintered body which contains indium oxide, and if necessary tin, while containing an additional element having an oxygen binding energy of 100-350 kJ/mol (excluding Ba, Mg and Y) in an amount of not less than 0.0001 mole but less than 0.10 mole per 1 mole of indium. The transparent conductive film contains indium oxide, and if necessary tin, while containing the additional element.