| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a treatment gas supply system for controlling raw gas concentration at a very low concentration, from several ppb level to several hundred ppb level, with sufficient accuracy. <P>SOLUTION: As for the treatment gas supply system, the treatment gas supply system 2 which feeds raw gas diluted by dilution gas to a gas using system 4, includes a treatment gas tank 10; a dilution gas tank 12; a main gas passageway 14 which connects the treatment gas tank and the gas-using system; two or more flux rate controllers FC1, FC5 which intervenes in the main gas passageway; a dilution gas passageway 16, which extends from the dilution gas tank 12 and is connected to a main gas passageway on the downstream side, directly under each flux rate controller, on other than that the lowest downstream side out of two or more flux rate controllers; a flux rate controller FC2, which intervenes in the dilution gas passageway; and a surplus gas discharge passage 24, which is connected with the main gas passageway on the upstream side, directly above each flux rate controller, on other than the most upstream side out of two or more flux rate controllers, for ejecting the diluted surplus raw gas. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
