发明名称 FILM FOR SEMICONDUCTOR WAFER PROCESSING
摘要 <p>Disclosed is a film (10) for semiconductor wafer processing, which is a processing film of a multilayer structure comprising a generally circular adhesive film (11) to be cut into chip-sized pieces together with a semiconductor wafer (W) by being adhered to the semiconductor wafer (W) and expanded in the adhered state, and a generally circular adhesive tape (12) bonded to the other side of the adhesive film (11) which is the side opposite to the one adhered to the semiconductor wafer (W). The ratio of the diameter of the adhesive film (11) relative to that of the adhesive tape (12) is within the range of 0.815-1.</p>
申请公布号 WO2009044566(A1) 申请公布日期 2009.04.09
申请号 WO2008JP56115 申请日期 2008.03.28
申请人 THE FURUKAWA ELECTRIC CO., LTD.;OKAWARA, YOSUKE;MARUYAMA, HIROMITSU;MORISHIMA, YASUMASA;ISHIWATA, SHINICHI 发明人 OKAWARA, YOSUKE;MARUYAMA, HIROMITSU;MORISHIMA, YASUMASA;ISHIWATA, SHINICHI
分类号 H01L21/301 主分类号 H01L21/301
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