发明名称 |
SOLID STATE IMAGING DEVICE, METHOD OF MANUFACTURING THE SAME, AND IMAGING APPARATUS |
摘要 |
<p>A solid state imaging device, a method for manufacturing the same, and an imaging apparatus are to record an image with high quality by reducing a dark current without changing the potential of a peripheral circuit unit. A plurality of sensor units(12) are formed in a semiconductor substrate and convert incident light into an electric signal. A peripheral circuit unit(14) is formed in the semiconductor substrate to be located in a side of the sensor unit. A layer(22) with a negative fixed electric charge is formed in the light input side of the sensor unit and forms a hole accumulating layer on a light receiving surface of the sensor unit.</p> |
申请公布号 |
KR20090034763(A) |
申请公布日期 |
2009.04.08 |
申请号 |
KR20080097079 |
申请日期 |
2008.10.02 |
申请人 |
SONY CORPORATION |
发明人 |
OHGISHI YUKO |
分类号 |
H01L27/146;H01L31/10;H04N5/335;H04N5/361;H04N5/369 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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