| 摘要 |
<p>A polishing pad is provided to obtain a uniform polished surface of an object by restricting the abrasion in polishing. A polishing pad(1) comprises a polyurethane sheet(2) having a volume density of 0.2~0.4g/cm and a thickness of 0.7~2.0mm, and a double-sided adhesive tape(8). The polyurethane sheet includes foam(3) about half the thickness and foam(4) more than 70% of the thickness which are opened by buffing, and apertures(5,6) on a polishing surface(P). The ratio of apertures of 30~50mum is over 50%, and the number of the apertures per 1mm^2 of the polishing surface is 50~100.</p> |
