发明名称 METHOD FOR PRODUCING ZINC OXIDE SEMICONDUCTOR CRYSTAL
摘要 <p>A method of producing a zinc oxide-based semiconductor crystal, including: introducing at least zinc and oxygen on a surface of a substrate; and growing a zinc oxide-based semiconductor crystal on the substrate, wherein a total or partial portion of the zinc is ionized in a vacuum atmosphere of 1×10 -4 Torr or less and is introduced to the surface of the substrate to grow the ZnO based semiconductor crystal. As a result, it is possible to provide a method of producing a zinc oxide based semiconductor crystal capable of growing a zinc oxide semiconductor crystal having excellent surface flatness and crytsallinity and including an extremely small amount of impurities at a high growth rate.</p>
申请公布号 EP2045838(A1) 申请公布日期 2009.04.08
申请号 EP20070767443 申请日期 2007.06.22
申请人 FUJIKURA, LTD.;CHIBA UNIVERSITY 发明人 OMICHI, KOJI;KAIFUCHI, YOSHIKAZU;FUJIMAKI, MUNEHISA;YOSHIKAWA, AKIHIKO
分类号 H01L21/363;C23C14/08;C23C14/46;C30B23/02;C30B29/16;H01L21/02 主分类号 H01L21/363
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