发明名称 Lithographic apparatus and associated vibration damping method
摘要 <p>The present invention relates to a control system for controlling a position or position related quantity of an object, comprising: a measurement system configured to measure a position or position related quantity of the object, a controller configured to provide a control signal on the basis of the measured position or position related quantity, and an actuator configured to actuate the object on the basis of the control signal, wherein the control system further comprises at least one filter unit configured to filter the measured position or position related quantity, wherein the at least one filter unit is a partial order filter unit.</p>
申请公布号 EP2045686(A2) 申请公布日期 2009.04.08
申请号 EP20080165684 申请日期 2008.10.02
申请人 ASML NETHERLANDS BV 发明人 BUTLER, HANS;VAN DER WIJST, MARC WILHELMUS MARIA;DE HOON, CORNELIUS ADRIANUS LAMBERTUS
分类号 G05D19/02;G03F7/20 主分类号 G05D19/02
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