APPARATUS FOR COATING PHOTORESIST

摘要

An apparatus of coating photoresist is provided to form the blocking plate which is parallel with the direction of the slit nozzle and prevent the damage of the slit nozzle. The substrate is settled in the stage. The photoresist is coated onto the top of the substrate through the slit nozzle(300). The traveling direction of the slit nozzle is parallel with the stage. The vibration sensor(380) is adhered to the slit nozzle. The blocking plate(350) is adhered to the front part of the slit nozzle. The blocking plate is formed parallel with the slit direction of the slit nozzle.