LITHOGRAPHIC APPARATUS, PROJECTION ASSEMBLY AND ACTIVE DAMPING

摘要

A lithography apparatus, a projecting assembly and active damping are provided to reduce influence of vibration of the projecting system within a predetermined range by driving an actuator depending on a signal from a sensor. A lighting system conditions the radiation beams. A supporter supports a patterning device. The patterning device gives the pattern to the cross section of the radiation beams for forming the patterned radiation beams. A substrate table is formed in order to maintain the substrate. A projecting system projects the patterned radiation beams to the top of the target part of the substrate. An active damping system damps the whole or a part of vibration of the projecting system. The active damping system includes a sensor measuring a position quantity of the projecting system and an actuator giving the force to the projecting system depending on the signal from the sensor. The active damping system is connected to the damping mass.