发明名称 |
Lithographic apparatus, projection assembly and active damping |
摘要 |
A lithographic apparatus comprises an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The lithographic apparatus further comprises a substrate table constructed to hold a substrate; and a projection system configured to project the patterned beam onto a target portion of the substrate. An active damping system is provided to dampen a vibration of at least part of the projection system. The active damping system comprises a combination of a sensor to measure a position quantity of the projection system and an actuator to exert a force on the projection system in dependency of a signal provided by the sensor. The active damping system is connected to a damping mass, the damping mass being connected to the projection system.
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申请公布号 |
EP2045664(A2) |
申请公布日期 |
2009.04.08 |
申请号 |
EP20080165761 |
申请日期 |
2008.10.02 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER WIJST, MARC WILHELMUS MARIA;DE HOON, CORNELIUS ADRIANUS LAMBERTUS;LOOPSTRA, ERIK ROELOF |
分类号 |
G03F7/20;B60G17/015;F16F7/10;F16F15/03 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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