| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To control more minutely a step shape of a resist pattern formed on a target transfer body. <P>SOLUTION: In this multi-gradation photomask where a transfer pattern including a shielding part, a translucent part, a first semi-translucent part and a second semi-translucent part is formed on a transparent substrate, a transmittance of the first semi-translucent part to exposure light is smaller than that of the second semi-translucent part to the exposure light, and a phase difference between exposure light transmitted through the first semi-translucent part and exposure light transmitted through the second semi-translucent part is controlled so that light intensity formed by interference between the exposure light transmitted through the first semi-translucent part and the exposure light transmitted through the second semi-translucent part becomes equal to or higher than intensity of the exposure light transmitted through the first semi-translucent part. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
