发明名称 |
SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
<p>Disclosed is a semiconductor substrate having a semiconductor device formable region, wherein a reinforcing section which is thicker than the semiconductor device formable region and has a top portion having a flat surface is formed on the outer circumferential portion of the semiconductor substrate, and the inner side surface, which connects the top portion of the reinforcing section and the semiconductor device formable region has a cross-section shape wherein the inner diameter is reduced toward the semiconductor device formable region.</p> |
申请公布号 |
WO2010140666(A1) |
申请公布日期 |
2010.12.09 |
申请号 |
WO2010JP59473 |
申请日期 |
2010.06.03 |
申请人 |
MITSUMI ELECTRIC CO., LTD.;YAMAZAKI, MITSUHARU |
发明人 |
YAMAZAKI, MITSUHARU |
分类号 |
H01L21/02;H01L21/336;H01L27/12;H01L29/78 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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