发明名称 SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>Disclosed is a semiconductor substrate having a semiconductor device formable region, wherein a reinforcing section which is thicker than the semiconductor device formable region and has a top portion having a flat surface is formed on the outer circumferential portion of the semiconductor substrate, and the inner side surface, which connects the top portion of the reinforcing section and the semiconductor device formable region has a cross-section shape wherein the inner diameter is reduced toward the semiconductor device formable region.</p>
申请公布号 WO2010140666(A1) 申请公布日期 2010.12.09
申请号 WO2010JP59473 申请日期 2010.06.03
申请人 MITSUMI ELECTRIC CO., LTD.;YAMAZAKI, MITSUHARU 发明人 YAMAZAKI, MITSUHARU
分类号 H01L21/02;H01L21/336;H01L27/12;H01L29/78 主分类号 H01L21/02
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