| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition excellent in solubility of a component for a resist and for forming a high-resolution resist pattern of good shape, and to provide a resist pattern forming method. <P>SOLUTION: The resist composition is prepared by dissolving a base component which exhibits changed solubility in an alkali developer under the action of an acid and an acid generator component containing an acid generator (B1) comprising a compound represented by general formula (b1) in an organic solvent containing an alcoholic organic solvent having a boiling point of ≥150°C, wherein R<SP>7"</SP>-R<SP>9"</SP>represent aryl or alkyl, at least one of R<SP>7"</SP>-R<SP>9"</SP>is substituted aryl substituted by a group represented by -O-R<SP>70</SP>(R<SP>70</SP>is an organic group), any two of R<SP>7"</SP>-R<SP>9"</SP>may bond to each other to form a ring with S in the formula; X is a 3-30C hydrocarbon group; Q<SP>1</SP>is an O-containing divalent linking group; and Y<SP>1</SP>is 1-4C alkylene or fluorinated alkylene. <P>COPYRIGHT: (C)2011,JPO&INPIT |
