| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of preventing occurrence of an exposure failure. <P>SOLUTION: This exposure apparatus includes: a first supply port for supplying a first liquid; an optical system having an emission surface for emitting exposure light; a liquid immersion member arranged at least in a part around an optical path of the exposure light emitted from the emission surface for forming an immersion space of the first liquid so that the optical path of the exposure light is filled with the first liquid; and a cleaning member having a second supply port capable of supplying a second liquid for cleaning the undersurface of the liquid immersion member for supplying the second liquid to the undersurface from the second supply port arranged below the undersurface to clean at least a part of the undersurface. In at least a part of exposure of a substrate, the substrate is moved below the liquid immersion member and the cleaning member, and in at least a part of the exposure of the substrate, the immersion space is formed between the emission surface and a surface of the substrate and between at least a part of the undersurface and the surface of the substrate. The exposure apparatus exposes the substrate with the exposure light from the emission surface through the first liquid between the emission surface and the surface of the substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT |
