| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an electrode configuration of a plasma processing device which supplies microwaves to a treatment chamber using a rectangular waveguide, and also to provide a method for supplying electromagnetic waves using the electrode. <P>SOLUTION: A microwave plasma processing device 100 includes microwave sources 40 which output the microwaves, the rectangular waveguides 31 which transmit the microwaves, and a metal slot antenna 32 in which slot groups 32ag including two or more slots are formed at equal intervals for every multiple of the in-tube wavelength λg/2 of the microwaves transmitted through the rectangular waveguides 31. The plasma processing device also supplies the microwaves transmitted through the rectangular waveguides 31 from the slot groups 32ag formed at equal intervals to the treatment chamber and then propagates them along metal surfaces of the slot antennas 32 forming the inner wall of the treatment chamber. As a result, gas is excited by energy of the microwaves to form plasma, and plasma treatment is applied to a substrate G in the treatment chamber. <P>COPYRIGHT: (C)2011,JPO&INPIT |
