发明名称 VAPOR DEPOSITION MASK AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition mask capable of reducing a damage imposed on a formed layer, since when the vapor deposition mask is adhered to a material layer of low hardness, a flaw is caused due to a difference in hardness and the display quality of an organic EL device after completion is deteriorated. SOLUTION: The vapor deposition mask comprises: opening parts 22 each of which has a first surface of facing a substrate to be vapor-deposited and a second surface of facing a vapor deposition source and is formed on a first area as the area corresponding to the pattern formation area of the substrate to be vapor-deposited; and spacers 35 formed on the first surface side of peripheral areas of the opening parts 22. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010275598(A) 申请公布日期 2010.12.09
申请号 JP20090130083 申请日期 2009.05.29
申请人 SEIKO EPSON CORP 发明人 KUWABARA TAKAYUKI;ISHIHARA JUN
分类号 C23C14/04;H01L51/50;H05B33/10 主分类号 C23C14/04
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