| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a ferrite thin film that can perform uniform deposition, even if a substrate has a three-dimensional complex shape and has high efficiency of production. SOLUTION: The apparatus includes: a temperature-raising chamber 20 for heating a substrate 1 for raising temperature; a deposition chamber 30 for deposition a ferrite thin film in the heated substrate for increasing temperature; a cooling chamber 40 for cooling the substrate, where the ferrite thin film has been deposited; and a carrying device for carrying the substrate. The substrate 1 is carried by the carrying device and passes the temperature-raising chamber 20, deposition chamber 30, and cooling chamber 40 in this order, and the temperature-raising chamber and the deposition chamber and then the deposition chamber and the cooling chamber are mutually connected by an open/close shutter 17. Each chamber includes a turning table 3, and a pedestal 2 for installing the substrate 1, and the substrate 1 is carried by the carrying device along with the pedestal 2. COPYRIGHT: (C)2011,JPO&INPIT
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