发明名称 SEMICONDUCTOR STORAGE DEVICE
摘要 Disclosed is a semiconductor storage device wherein, at the time of writing information on the memory cell of SPRAM composed of an MOS transistor and a tunnel magnetoresistive element, the memory cell is supplied with a current in the direction opposite to the direction of a current required for writing the information on the memory cell, then, the memory cell is supplied with a current required for writing. Thus, even if the same information is sequentially written on the memory cell, since the currents in the two directions are permitted to flow in a pair in the tunnel magnetoresistive element of the memory cell each time information is rewritten, deterioration of a film that constitutes the tunnel magnetoresistive element can be suppressed. Therefore, the reliability of the SPRAM can be improved.
申请公布号 WO2010140615(A1) 申请公布日期 2010.12.09
申请号 WO2010JP59334 申请日期 2010.06.02
申请人 HITACHI, LTD.;KAWAHARA, TAKAYUKI;ITOH, KIYOO;TAKEMURA, RIICHIRO;ITO, KENCHI 发明人 KAWAHARA, TAKAYUKI;ITOH, KIYOO;TAKEMURA, RIICHIRO;ITO, KENCHI
分类号 G11C11/15;H01L21/8246;H01L27/105;H01L43/08 主分类号 G11C11/15
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