METHOD FOR MANUFACTURING POLISHING SLURRY CONTAINING NANO-DIAMONDS, POLISHING SLURRY MANUFACTURED BY THE METHOD, AND POLISHING METHOD USING THE POLISHING SLURRY
摘要
PURPOSE: A polishing slurry is provided to minimally reduce surface roughness and to improve planarity and to reduce surface roughness of a wafer and plate in polishing. CONSTITUTION: A method for manufacturing a surface abrasive comprises a step of mixing 60~72 wt% colloidal silica(SiO2), 0.5~3 wt% diamond with nano diameter, and 27.5~37 wt% ethylene glycol. A polishing method using a surface abrasive including nanodiamond comprises the steps of: positioning object(S) on a polishing platen(10) and a polishing pad(15); and providing the abrasive on the polishing platen and the polishing pad, an rotating the polishing platen and the polishing pad to polish the object.
申请公布号
KR20100128971(A)
申请公布日期
2010.12.08
申请号
KR20090047678
申请日期
2009.05.29
申请人
KOREA POLYTECHNIC UNIVERSITY INDUSTRY ACADEMIC COOPERATION FOUNDATION
发明人
CHO, UN CHUNG;LEE, WON GUN;BAE, YOUNG JE;MAE, YONG HOON;JUNG, YONG HWA;JUN, GU SIK;WOO, WON HEE;KIM, HEUN DUK