发明名称 LITHOGRAPH APPARATUS FOR USING A BALLISTIC-ELECTRON EMISSION DEVICE
摘要 <p>PURPOSE: A lithograph apparatus using a ballistic-electron emission device is provided to reduce the size by simplifying the structure of a lithography apparatus by minimizing a scanning process for patterning or skipping the scanning process. CONSTITUTION: A ballistic electron discharging device(110) is installed inside the main body(120) and discharges the ballistic electron. A top electrode(114) of the ballistic electron discharging device is arranged in a direction opposing a transmitting window. The inside of the main body is maintained to keep the vacuum condition.</p>
申请公布号 KR20100128802(A) 申请公布日期 2010.12.08
申请号 KR20090047424 申请日期 2009.05.29
申请人 KOREA ATOMIC ENERGY RESEARCH INSTITUTE 发明人 HAN, YOUNG HWAN;LEE, BYUNG CHEOL;CHOI, YONG WOON
分类号 H01L21/027;H01J1/304 主分类号 H01L21/027
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