发明名称 Illumination optical system and exposure apparatus
摘要 An illumination optical system that is used for an exposure apparatus that includes a mirror and exposes an object, illuminates a surface to be illuminated using light from a light source, and includes a filter member arranged at a position that substantially has a Fourier transform relationship with the surface to be illuminated, the filter member including a transmittance distribution preset to correct a nonuniformity of a transmittance distribution of the illumination optical system caused by the mirror.
申请公布号 EP2259138(A2) 申请公布日期 2010.12.08
申请号 EP20100176138 申请日期 2005.06.01
申请人 CANON KABUSHIKI KAISHA 发明人 SHIOZAWA, TAKAHISA;GOTO, YOSHIO
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项
地址