| 摘要 |
PURPOSE: A batch style substrate treatment apparatus is provided to implement the uniform substrate treatment all over the substrate by uniformly controlling the internal temperature of a chamber by the convection of the gas supplied to the chamber. CONSTITUTION: A chamber(200) offers the process space of a substrate(10). A main heater(300) heats the substrate loaded in the chamber. A boat(400) loads and supports the substrate in multiple layers. A gas supplying nozzle(500) supplies the gas within the chamber. A gas discharge nozzle(600) discharges the gas supplied to the chamber to the outside of the chamber.
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