LITHOGRAPHIC APPARATUS AND METHOD FOR ILLUMINATION UNIFORMITY CORRECTION AND UNIFORMITY DRIFT COMPENSATION

摘要

PURPOSE: A lithographic apparatus for illumination uniformity correction and uniformity drift compensation is provided to reduce costs per device, to efficiently perform a lithographic process, and to minimize defects. CONSTITUTION: A lithographic apparatus comprises an illumination system for condition radiation beams. The illumination system includes a uniformity correction system positioned on a plane so that a fixed pupil is accommodated when lighted by the radiation beams. The uniformity correction system comprises fingers(708) and actuating devices for moving the corresponding fingers.