A FABRICATING METHOD OF BURIED CONTACT SOLAR CELL

摘要

PURPOSE: A manufacturing method is provided to simplify the entire process by simultaneously executing the surface texturing process and groove forming process of a semiconductor substrate through a single etching process. CONSTITUTION: A porous mask layer(110) is formed on a semiconductor substrate(100). A patterned porous mask layer(110') is formed by removing a part of the porous mask layer. A groove for a surface texturing and a groove for a front electrode are simultaneously formed on the semiconductor substrate by using the patterned porous mask layer. A selective emitter layer(120) is formed on the semiconductor substrate. A reflection barrier layer(130) is formed on the emitter layer.