发明名称 Planar programmable metallization memory cells
摘要 Programmable metallization memory cells that have an inert electrode and an active electrode positioned in a non-overlapping manner in relation to a substrate. A fast ion conductor material is in electrical contact with and extends from the inert electrode to the active electrode, the fast ion conductor including superionic clusters extending from the inert electrode to the active electrode. A metal layer extends from the inert electrode to the active electrode, yet is electrically insulated from each of the inert electrode and the active electrode by the fast ion conductor material. Methods for forming programmable metallization cells are also disclosed.
申请公布号 US7847278(B2) 申请公布日期 2010.12.07
申请号 US20080233770 申请日期 2008.09.19
申请人 SEAGATE TECHNOLOGY LLC 发明人 KHOUEIR ANTOINE;XI HAIWEN;HUANG SHUIYUAN
分类号 H01L47/00 主分类号 H01L47/00
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