发明名称 |
Ultra high speed uniform plasma processing system |
摘要 |
An apparatus for processing a substrate with a plasma. The apparatus includes first and second electrodes positioned with a spaced apart relationship. A separating ring has a vacuum-tight engagement with confronting surfaces of the first electrode and the second electrode to define an evacuatable processing region therebetween. Communicating with the processing region is a process gas port for introducing a process gas to the processing region. The processing region may be evacuated through a vacuum port defined in one of the first and second electrodes to a pressure suitable for exciting a plasma from the process gas in the processing region when the first and second electrodes are powered.
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申请公布号 |
US7845309(B2) |
申请公布日期 |
2010.12.07 |
申请号 |
US20040710457 |
申请日期 |
2004.07.13 |
申请人 |
NORDSON CORPORATION |
发明人 |
CONDRASHOFF ROBERT S.;FAZIO JAMES P.;GETTY JAMES D.;TYLER JAMES S. |
分类号 |
C23C16/50;C23C16/06;C23C16/22;C23C16/503;C23C16/509;C23F1/00;H01L21/306 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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