发明名称 |
Method and apparatus for gas concentration quantitative analysis |
摘要 |
An FTIR measurement is conducted on a background gas to obtain a single beam spectrum SB(BG) [C] and a synthetic single beam spectrum SSB(BG)[D], and an FTIR measurement is conducted on a sample gas to obtain a single beam spectrum SB(Samp)[E] and a synthetic single beam spectrum SSB(Samp)[F]. A double synthetic absorbance spectrum DSAbs of the sample gas as expressed by the following formula (Step T9) is calculated to obtain a concentration of a trace component (impurity) contained in the sample gas: DSAbs =−log[SB(Samp) SSB(BG)/SSB(Samp) SB(BG)]
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申请公布号 |
US7847935(B2) |
申请公布日期 |
2010.12.07 |
申请号 |
US20080050244 |
申请日期 |
2008.03.18 |
申请人 |
OTSUKA ELECTRONICS CO., LTD. |
发明人 |
NITTA SATOSHI;OSAWA YOSHIHIRO |
分类号 |
G01J3/42 |
主分类号 |
G01J3/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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