发明名称 |
PROCESS AND APPARATUS FOR FABRICATING MAGNETIC DEVICE |
摘要 |
<p>PURPOSE: An apparatus and a method for manufacturing a magnetic element are provided to reduce damages generated from an etching process without an oxidation reaction on the etched surface of the magnetic element by changing a magnetic property using a mixed gas of a carbon hydride gas and a non-active gas. CONSTITUTION: High frequency power supplying source for plasma(13) generates high frequency power which is applied to an antenna(12). A current flows through the antenna. An electromagnet(14) generates pre-set magnetic field in a dielectric wall-based container(11). A plurality of magnets for a sidewall(22) is arranged along the external peripheral of the sidewall in order to prevent the spread of plasma to the inside of the sidewall.</p> |
申请公布号 |
KR20100128256(A) |
申请公布日期 |
2010.12.07 |
申请号 |
KR20100049622 |
申请日期 |
2010.05.27 |
申请人 |
CANON ANELVA CORPORATION |
发明人 |
SHINDE SANJAY;KODAIRA YOSHIMITSU;FURUMOCHI TAROH |
分类号 |
H01L27/115;G11C11/15;H01L21/3065 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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