发明名称 PROCESS AND APPARATUS FOR FABRICATING MAGNETIC DEVICE
摘要 <p>PURPOSE: An apparatus and a method for manufacturing a magnetic element are provided to reduce damages generated from an etching process without an oxidation reaction on the etched surface of the magnetic element by changing a magnetic property using a mixed gas of a carbon hydride gas and a non-active gas. CONSTITUTION: High frequency power supplying source for plasma(13) generates high frequency power which is applied to an antenna(12). A current flows through the antenna. An electromagnet(14) generates pre-set magnetic field in a dielectric wall-based container(11). A plurality of magnets for a sidewall(22) is arranged along the external peripheral of the sidewall in order to prevent the spread of plasma to the inside of the sidewall.</p>
申请公布号 KR20100128256(A) 申请公布日期 2010.12.07
申请号 KR20100049622 申请日期 2010.05.27
申请人 CANON ANELVA CORPORATION 发明人 SHINDE SANJAY;KODAIRA YOSHIMITSU;FURUMOCHI TAROH
分类号 H01L27/115;G11C11/15;H01L21/3065 主分类号 H01L27/115
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