发明名称 Masking paste, method of manufacturing same, and method of manufacturing solar cell using masking paste
摘要 A masking paste used as a mask for controlling diffusion when diffusing a p-type dopant and an n-type dopant into a semiconductor substrate and forming a high-concentration p-doped region and a high concentration n-doped region is provided that contains at least a solvent, a thickening agent, and SiO2 precursor and/or a TiO2 precursor. Further, a manufacturing method of a solar cell is provided in which the masking paste is pattern-formed on the semiconductor substrate and then the p-type dopant and the n-type dopant are diffused.
申请公布号 US7846823(B2) 申请公布日期 2010.12.07
申请号 US20060063542 申请日期 2006.08.08
申请人 SHARP KABUSHIKI KAISHA 发明人 FUNAKOSHI YASUSHI
分类号 H01L21/322;H01L21/22;H01L21/38 主分类号 H01L21/322
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