发明名称 |
Wide area radio frequency plasma apparatus for processing multiple substrates |
摘要 |
An antenna array for a radio frequency plasma process chamber including, an array of electrodes, an array of dielectric tubes concentrically disposed about each electrode tube to define a chamber configured to be at atmospheric pressure between an outer surface of each electrode tube and an inner surface of the corresponding dielectric tube, and a hermetic seal between each dielectric tube and the plasma process chamber configured to allow a vacuum or low pressure in the plasma process chamber.
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申请公布号 |
US7845310(B2) |
申请公布日期 |
2010.12.07 |
申请号 |
US20060635227 |
申请日期 |
2006.12.06 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
DIVERGILIO WILLIAM F.;SRIVASTAVA ASEEM K. |
分类号 |
C23C16/00;C23F1/00;H01L21/306;H05B31/26 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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