发明名称 GAS FEEDING DEVICE, TREATING DEVICE, TREATING METHOD, AND STORAGE MEDIUM
摘要 <p>A gas supply device 3 includes a device body 31 forming a substantially conical gas-conducting space 32 for conducting gases therethrough from a diametrally reduced end 32a of the space 32 to a diametrally enlarged end 32b thereof, gas introduction ports 61a to 63a, 61b to 63b, and 64, each provided near the diametrally reduced end 32a of the gas-conducting space 32 in the device body 31 to introduce the gases into the gas-conducting space 32, and a plurality of partitioning members 41 to 46 provided in the gas-conducting space 32 of the device body 31 to partition the gas-conducting space 32 concentrically. The partitioning members 42 to 46 arranged adjacently to each other at a radially outer side of the gas-conducting space 32 are greater than the adjacently arranged partitioning members 41 to 45 at a radially inner side in dimensionally diverging rate per partitioning member. Thus, internal gas flow channels of the gas supply device have high gas conductance and enhanced gas replaceability, compared with those of the conventional gas showerhead.</p>
申请公布号 KR20100127741(A) 申请公布日期 2010.12.06
申请号 KR20107007834 申请日期 2009.03.23
申请人 TOKYO ELECTRON LIMITED 发明人 TSUDA EINOSUKE
分类号 H01L21/205;H01L21/3065 主分类号 H01L21/205
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