发明名称 A SUSCEPTOR IN EPITAXIAL WAFER MANUFACTURING APPARATUS
摘要 PURPOSE: A susceptor in an epitaxial wafer manufacturing apparatus is provided to prevent damage to a wafer by suppressing an auto-doping even in case of an epitaxial wafer. CONSTITUTION: A plurality of exhaust holes(200) have a repeated certain pattern which has two holes having a &thgr;11 and &thgr;12 angle from the bottom of a susceptor(100). A plurality of exhaust holes have a symmetry pattern on the susceptor and have a bend form.
申请公布号 KR20100127681(A) 申请公布日期 2010.12.06
申请号 KR20090046212 申请日期 2009.05.26
申请人 SILTRON INC. 发明人 LEE, KYUNG SUN;BANG, KYU CHUL
分类号 H01L21/205;H01L21/683 主分类号 H01L21/205
代理机构 代理人
主权项
地址