发明名称 |
A SUSCEPTOR IN EPITAXIAL WAFER MANUFACTURING APPARATUS |
摘要 |
PURPOSE: A susceptor in an epitaxial wafer manufacturing apparatus is provided to prevent damage to a wafer by suppressing an auto-doping even in case of an epitaxial wafer. CONSTITUTION: A plurality of exhaust holes(200) have a repeated certain pattern which has two holes having a &thgr;11 and &thgr;12 angle from the bottom of a susceptor(100). A plurality of exhaust holes have a symmetry pattern on the susceptor and have a bend form.
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申请公布号 |
KR20100127681(A) |
申请公布日期 |
2010.12.06 |
申请号 |
KR20090046212 |
申请日期 |
2009.05.26 |
申请人 |
SILTRON INC. |
发明人 |
LEE, KYUNG SUN;BANG, KYU CHUL |
分类号 |
H01L21/205;H01L21/683 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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