| 摘要 |
<p>PURPOSE: A method for forming a phase shift mask using a binary blank is provided to prevent the generation of bridge defects due to a light shielding film pattern by preventing the residue of a light shielding film from remaining on a phase shift film pattern. CONSTITUTION: A main cell region(A) and a frame region(B) are defined on a transparent substrate(100). A light shielding pattern is formed on the transparent substrate. A phase shift layer is formed on the transparent substrate for burying the light shielding pattern. The phase shift layer is eliminated in order to form a phase shift pattern(135). A resist layer is formed on the light shielding pattern and the phase shift pattern. A resist layer pattern(145) is formed by patterning the resist layer.</p> |
