| 摘要 |
<p>PURPOSE: A multi-gray scale photomask, a manufacturing method thereof, and a method for transferring a pattern are provided to improve the yield of a TFT by precisely controlling the step shape of a resist pattern on an object. CONSTITUTION: A first semi-transmitting layer(111) is made of materials with Cr and has etching resistance against F based etchant. A second semi-transmitting layer(112) is made of materials with Si and metal materials like Mo. A shielding layer(113) is made of Cr.</p> |
