发明名称 APPARATUS FOR DEVELOP PROCESS
摘要 <p>PURPOSE: An apparatus for performing a development process is provided to uniformly apply developing liquid to a target layer by regulating the flow of the developing liquid. CONSTITUTION: A stage is arranged in a reaction chamber(200). A first tube(201) is in connection with the upper side of the reaction chamber. A second tube(203) is in connection with the lower side of the reaction chamber. A developing liquid supplying part(217) supplies developing liquid to the inside of the chamber through the first tube. A cleaning liquid supplying part(233) supplies cleaning liquid to the inside of the reaction chamber through the first tube.</p>
申请公布号 KR20100127669(A) 申请公布日期 2010.12.06
申请号 KR20090046199 申请日期 2009.05.26
申请人 HYNIX SEMICONDUCTOR INC. 发明人 GYUN, BYUNG GU
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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