PLASMA PROCESS APPARATUS AND PLASMA PROCESS METHOD

摘要

PURPOSE: A plasma processing device and a method thereof are provided to improve the reproduction of processing plasma while maintaining a process temperature low. CONSTITUTION: A holding support unit(28) supports a plurality of objects and inserts them to be divided. A gas supply unit(48) supplies gas to a processing chamber. An activation unit(58) makes the gas activated by plasma which is generated by high frequency power. An absorption header is installed at the end of the housing and receives cooling gas.