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发明名称
SYSTEMS AND METHODS FOR REDUCING THE INFLUENCE OF PLASMA-GENERATED DEBRIS ON THE INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE
摘要
申请公布号
EP1779410(A4)
申请公布日期
2010.11.10
申请号
EP20050775431
申请日期
2005.07.15
申请人
CYMER, INC.
发明人
ERSHOV, ALEXANDER, I.;MARX, WILLIAM, F.;BOWERING, NORBERT R.;HANSSON, BJORN, A., M.;KHODYKIN, OLEH;FOMENKOV, IGOR, V.;PARTLO, WILLIAM, N.
分类号
C25F1/00;G03F7/20;G21K1/06
主分类号
C25F1/00
代理机构
代理人
主权项
地址
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