| 发明名称 |
Ceramic film and manufacturing method therefor, semiconductor device and piezoelectric device |
| 摘要 |
<p>A method of manufacturing a ceramic film includes a step of forming a ceramic film 30 by crystallizing a raw material body 20. The raw material body 20 contains different types of raw materials in a mixed state. The different types of raw materials differ from one another in at least one of a crystal growth condition and a crystal growth mechanism in the crystallization of the raw materials. According to this manufacturing method, a surface morphology of the ceramic film can be improved.</p> |
| 申请公布号 |
EP2248765(A1) |
申请公布日期 |
2010.11.10 |
| 申请号 |
EP20100159795 |
申请日期 |
2001.06.14 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
NATORI, EIJI;FURUYAMA, KOICHI;TASAKI, YUUZO |
| 分类号 |
C01B13/14;C01G1/00;C01G29/00;C01G35/00;C04B35/475;C04B35/491;C04B35/624;H01L21/314;H01L21/316;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/105;H01L27/108;H01L41/187;H01L41/317;H01L41/318;H01L41/39;H01L41/43 |
主分类号 |
C01B13/14 |
| 代理机构 |
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