发明名称 |
APPARATUS FOR CLEANING GLASS |
摘要 |
PURPOSE: A substrate cleaning apparatus, which reduces the frequency of job change by possessively dealing with the change of a substrate, is provided to reduce a failure rate by removing sticky foreign materials from a substrate. CONSTITUTION: A substrate cleaning apparatus comprises a substrate transfer part(100), washing and polishing parts(200a,200b) and a unit movable part(100a). The washing and polishing parts are arranged on one or more domain of the substrate transfer part. The washing and polishing part has a polishing disc and a washing disc. The polishing disc removes foreign material from the substrate. The washing disc washes the substrate.
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申请公布号 |
KR20100119617(A) |
申请公布日期 |
2010.11.10 |
申请号 |
KR20090038633 |
申请日期 |
2009.05.01 |
申请人 |
SFA ENGINEERING CORP. |
发明人 |
YOON, MU YOUL;BHANG, SHIN HAN;CHOI, BYUNG KWON;LEE, YONG JU |
分类号 |
B08B1/02;B08B1/04;B08B7/04;H01L21/304 |
主分类号 |
B08B1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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