发明名称 APPARATUS FOR CLEANING GLASS
摘要 PURPOSE: A substrate cleaning apparatus, which reduces the frequency of job change by possessively dealing with the change of a substrate, is provided to reduce a failure rate by removing sticky foreign materials from a substrate. CONSTITUTION: A substrate cleaning apparatus comprises a substrate transfer part(100), washing and polishing parts(200a,200b) and a unit movable part(100a). The washing and polishing parts are arranged on one or more domain of the substrate transfer part. The washing and polishing part has a polishing disc and a washing disc. The polishing disc removes foreign material from the substrate. The washing disc washes the substrate.
申请公布号 KR20100119617(A) 申请公布日期 2010.11.10
申请号 KR20090038633 申请日期 2009.05.01
申请人 SFA ENGINEERING CORP. 发明人 YOON, MU YOUL;BHANG, SHIN HAN;CHOI, BYUNG KWON;LEE, YONG JU
分类号 B08B1/02;B08B1/04;B08B7/04;H01L21/304 主分类号 B08B1/02
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