发明名称 |
GROUP-III NITRIDE SEMICONDUCTOR LASER |
摘要 |
A group III nitride semiconductor laser is provided that has a good optical confinement property and includes an InGaN well layer having good crystal quality. An active layer 19 is provided between a first optical guiding layer 21 and a second optical guiding layer 23. The active layer 19 can include well layers 27a, 27b, and 27c and further includes at least one first barrier layer 29a provided between the well layers. The first and second optical guiding layers 21 and 23 respectively include first and second InGaN regions 21a and 23 a smaller than the band gap E 29 of the first barrier layer 29a, and hence the average refractive index n GUIDE of the first and second optical guiding layers 21 and 23 can be made larger than the refractive index n 29 of the first barrier layer 29a. Thus, good optical confinement is achieved. The band gap E 29 of the first barrier layer 29a is larger than the band gaps E 21 and E 23 of the first and second InGaN regions 21a and 23a.
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申请公布号 |
EP2249445(A1) |
申请公布日期 |
2010.11.10 |
申请号 |
EP20090715248 |
申请日期 |
2009.02.17 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
KYONO, TAKASHI;AKITA, KATSUSHI;YOSHIZUMI, YUSUKE |
分类号 |
H01S5/343 |
主分类号 |
H01S5/343 |
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