| 摘要 |
PURPOSE: A positive photosensitive resin composition is provided to ensure sensitivity, remaining film rate, and preservation stability and to form hardened film with thermal resistance. CONSTITUTION: A positive photosensitive resin composition contains: a resin which is soluble in alkali, and a compound which generate acid by irradiation of active ray. The resin contains a constitutive unit having a functional group which forms covalent bond by reacting the constitutive unit and carboxylic group. The resin is alkali insoluble or non-soluble. |
