VERIFICATION METHOD FOR REPAIR OF PHOTOLITHOGRAPHY MASK

摘要

PURPOSE: A method for verifying a repair of a photolithography mask is provided to verify the repair by comparing a vertical photo with a simulated vertical photo. CONSTITUTION: Defects of a mask produced by a mask layout are inspected. If the defects are formed on the mask, the defect position is stored as a file. The defect is repaired on a corresponding position. It is determined whether a tolerance criterion is satisfied according to various target dimension. If the tolerance criterion is satisfied, it is determined whether the repair is verified.