发明名称 Memory device and method of fabricating the same
摘要 A nonvolatile memory including a plurality of memory transistors in series, wherein source/drain and channel regions therebetween are of a first type and a select transistor, at each end of the plurality of memory transistors in series, wherein channels regions of each of the select transistors is of the first type. The first type may be n-type or p-type. The nonvolatile memory may further include a first dummy select transistor at one end of the plurality of memory transistors in series between one of the select transistors and the plurality of memory transistors in series and a second dummy select transistor at the other end of the plurality of memory transistors in series between the other select transistor and the plurality of memory transistors in series.
申请公布号 US7808036(B2) 申请公布日期 2010.10.05
申请号 US20070976389 申请日期 2007.10.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE CHANG-HYUN;CHOI JUNG-DAL
分类号 G11C16/04 主分类号 G11C16/04
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