METHOD OF PRODUCTION OF GRAPHENE

摘要

PURPOSE: A grapheme manufacturing method for annealing under irradiation and annealing is provided to obtain the grapheme on a surface of a substrate without requesting a moving stage on a supporter phase of the supporter extrinsic used grapheme layers. CONSTITUTION: A manufacturing method of grapheme includes as follows. A layer which includes in the top of the substrate amorphous carbon vaporizes. Grapheme anneals layer under the photon investigation and/or the electron irradiation. The substrate in which substrate includes the silicon. The substrate having unit cell having substrate is specific orientation. The silicon carbide substrate having the specific orientation is preferably grown up to the epitaxial type. The photon investigation is the laser irradiation.